World Journal of
Pharmaceutical and Life Sciences

DNA PATTERN ANALYSIS OF Vanilla planifolia Andrews PLANTLET WHICH RESISTANT TO Fussarium oxysporum f. sp. vanillae

Endang Nurcahyani*, Issirep Sumardi, Bambang Hadisutrisno and E. Suharyanto

ABSTRACT

Stem rot disease is one of the production constraints in vanilla cultivation (Vanilla planifolia Andrews) caused by Fusarium oxysporum f. sp. vanillae (Fov). This disease has not been effectively addressed even though several studies have been conducted. Important disease control alternatives to vanilla include the use of Fov resistant cultivars. The Fov resistant vanilla planlet has been selected in vitro in Murashige & Skoog (MS) medium with the addition of Fusaric Acid (FA) at concentrations of 0, 90, 100, 110, and 120 ppm.The FA tolerant concentration for plantlet selection with vanilla steady growth is between 90 ppm-110 ppm; the 110 ppm of FA was effective for suppressing the Fov compared to 90 ppm and 100 ppm respectively. To obtain an overview of the mechanism of resilience of planlet to Fov, a more in-depth study of the pattern of DNA V. planifolia planlet resistant to Fov compared with control. The DNA pattern analysis using PCR_RAPD method. The results showed that a new (specific) band of DNA in a resistant plantlet in size of 930 bp (OPB_14), 430 bp (OPB_20), 230 bp and 270 bp (OPD_19) respectively. These bands predicted as a candidate marker RAPD which responsible for vanilla resistant to Fov. A new (specific) band of DNA can become a specific grouping and separate character to vanilla plantlet control and that to induce with FA of 90, 100, 110 ppm.

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